Semiconductor device including independent active layers and method for fabricating the same

ABSTRACT

A semiconductor device includes a semiconductor substrate of n-type silicon including, in an upper portion thereof, a first polarity inversion region and a second polarity inversion regions spaced from each other and doped with a p-type impurity. A first HFET including a first active layer and a second HFET including a second active layer both made of a group III-V nitride semiconductor are independently formed on the respective polarity inversion regions in the semiconductor substrate, and the HFETs are electrically connected to each other through interconnects.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority under 35 U.S.C. §119 on PatentApplication Nos. 2004-359447 and 2005-316247 filed in Japan respectivelyon Dec. 13, 2004 and Oct. 31, 2005, the entire contents of which arehereby incorporated by reference.

BACKGROUND OF THE INVENTION

The present invention relates to a semiconductor device and a method forfabricating the same, and more particularly it relates to asemiconductor device including a plurality of high power elements usinga group III-V nitride semiconductor.

A group III-V nitride semiconductor is a compound semiconductor of acompound composed of aluminum (Al), boron (B), gallium (Ga) or indium(In) and nitride (N) represented by a general formula ofB_(w)Al_(x)Ga_(y)In_(z)N (wherein w+x+y+z=1 and 0≦w, x, y, z≦1).

A group III-V nitride semiconductor has various advantages such as alarge band gap, a high breakdown voltage derived from the large bandgap, a high electron saturation velocity and high electron mobility, anda high electron concentration attained in forming a heterojunction, andtherefore, various examinations and developments are now being made onapplication to a short-wavelength light emitting device, a high powerhigh-frequency device, a high-frequency low-noise amplifier device, ahigh power switching device and the like.

Conventionally, such devices are developed as simplex devices forattaining performances that are realized by utilizing good materialcharacteristics (physical properties) of a group III-V nitridesemiconductor itself but cannot be realized by using other materials.

FIG. 11 is a cross-sectional view of a conventional group III-V nitridesemiconductor device using a heterojunction (see, for example, JapanesePatent Publication No. 2996169 or 3409958). As shown in FIG. 11, theconventional group III-V nitride semiconductor device includes anoperation layer 102 of gallium nitride (GaN) and a barrier layer 103 ofaluminum gallium nitride (AlGaN) successively stacked on a semiconductorsubstrate 101 with a conducting property, and a heterojunction is formedon an interface between the operation layer 102 and the barrier layer103 having different band gaps.

The barrier layer 103 is partitioned by an insulating isolation region104 reaching an upper portion of the operation layer 102, a Schottkygate electrode 105 is formed on the partitioned barrier layer 103, andan ohmic source electrode 106 and an ohmic drain electrode 107 areformed on both sides of the gate electrode 105 along the gate lengthdirection. Thus, the semiconductor device is operated as aheterojunction field effect transistor (hereinafter referred to as theHFET).

In the vicinity of the interface in the operation layer 102 of theheterojunction between the operation layer 102 and the barrier layer103, electrons derived from a difference in spontaneous polarization andpiezo-electric polarization between the operation layer 102 and thebarrier layer 103, an n-type impurity doped in the barrier layer 103 andother uncontrollable defects caused in the operation layer 102 and thebarrier layer 103 are accumulated in a high concentration so as to forma two-dimensional electron gas (2DEG), and the thus formed 2DEG works asa channel carrier of the field effect transistor.

The source electrode 106 is electrically connected to the semiconductorsubstrate 101 set to ground potential through a surface via interconnect108, so as to reduce a parasitic component in a high-frequency orhigh-speed switching operation. Also, the semiconductor substrate 101set to the ground potential functions also as a field plate (fieldreleasing plate), and therefore, it exhibits an effect to releaseconcentration of the electric field in a device active region, andparticularly at an end of the gate electrode 105 closer to the drainelectrode 107.

In the conventional group III-V nitride semiconductor device, however,current leakage is caused through the semiconductor substrate 101 in ahigh voltage operation, and therefore, it is difficult to electricallyconnecting or integrating a plurality of elements (HFETs) formed on onesemiconductor substrate 101.

SUMMARY OF THE INVENTION

The present invention was devised for overcoming the aforementionedconventional problem, and an object of the invention is integrating aplurality of elements made of a group III-V nitride semiconductor on asemiconductor substrate with a conducting property.

In order to achieve the object, in the semiconductor device according tothe invention, a plurality of semiconductor elements each having anactive layer made of a group III-V nitride semiconductor are formed onpolarity inversion regions with a polarity different from theconductivity type of a semiconductor substrate or on a semiconductorsubstrate having a buried insulating layer.

The first semiconductor device of this invention includes asemiconductor substrate of a first conductivity type having, in an upperportion thereof, a plurality of polarity inversion regions spaced fromone another and formed by introducing an impurity of a secondconductivity type; a plurality of semiconductor elements selectivelyformed respectively on the polarity inversion regions and respectivelyincluding independent active layers made of a group III-V nitridesemiconductor; and interconnects for electrically connecting thesemiconductor elements to one another.

In the first semiconductor device, semiconductor elements areelectrically insulated from each other even within the semiconductorsubstrate owing to a depletion layer formed by a pn junction betweeneach polarity inversion region and the semiconductor substrate.Therefore, even when the respective semiconductor elements areelectrically connected to one another through interconnects and operatedat a high voltage, a leakage current caused between the semiconductorelements through the semiconductor substrate can be suppressed to bevery small. Accordingly, a semiconductor device including a plurality ofsemiconductor elements respectively having independent active layersmade of a group III-V nitride semiconductor and electrically connectedto one another can be integrated on a semiconductor substrate with aconducting property.

In the first semiconductor device, each of the semiconductor elementspreferably has at least one terminal, and at least one of thesemiconductor elements is preferably electrically connected to thesemiconductor substrate at the terminal. Thus, the semiconductorsubstrate connected to one terminal of the semiconductor elementfunctions as a field plate for releasing the electric field, andtherefore, a higher breakdown voltage can be attained. Furthermore,since the semiconductor substrate has the same potential with respect tothe plural semiconductor elements, if the semiconductor substrate isconnected to a terminal for supplying common potential to thesemiconductor elements, such as ground potential, a ground interconnectcan be reduced.

In the first semiconductor device, preferably, the first conductivitytype is p-type, the second conductivity type is n-type, and the III-Vgroup nitride semiconductor includes an n-type layer. Accordingly, thepositive source voltage applied at operation of the active layer made ofthe n-type III-V group nitride semiconductor forms a depletion layer atthe interface of the p-n junction between each p-type polarity inversionregion and the n-type active layer, thereby realizing higher breakdownvoltage and smaller leakage current.

In the first semiconductor device, a concentration of the impurity ineach of the polarity inversion regions is preferably lower in aperipheral portion thereof than in an inner portion thereof on aprincipal face of the semiconductor substrate. Thus, a breakdown voltagebetween the polarity inversion region and another region becomes higher,and hence, the semiconductor device can be operated at a higher voltage.

The first semiconductor device preferably further includes insulatingisolation regions formed in the semiconductor substrate between thepolarity inversion regions. Thus, a breakdown voltage between thepolarity inversion region and another region becomes higher, thesemiconductor device can be operated at a higher voltage.

In the first semiconductor device, a mark for identifying a position ofeach of the polarity inversion regions is preferably formed in thesemiconductor substrate. Thus, after forming the semiconductor layerincluding the active layers made of the group III-V nitridesemiconductor, alignment between the semiconductor layer and eachpolarity inversion region is eased.

In this case, the mark is preferably exposed on the semiconductorsubstrate.

The first method for fabricating a semiconductor device of thisinvention includes the steps of forming, in an upper portion of asemiconductor substrate of a first conductivity type, a plurality ofpolarity inversion regions spaced from one another by selectivelyintroducing a first impurity of a second conductivity type into thesemiconductor substrate; forming a semiconductor layer made of a groupIII-V nitride over the semiconductor substrate including the polarityinversion regions; forming insulating isolation regions extending fromthe semiconductor layer to the semiconductor substrate by selectivelyintroducing a second impurity into portions of the semiconductor layerand the semiconductor substrate disposed around the polarity inversionregions, whereby respectively forming, on the polarity inversionregions, a plurality of element forming regions each including an activelayer in the semiconductor layer; forming a plurality of semiconductorelements by forming electrodes on the element forming regions; andforming interconnects for electrically connecting the semiconductorelements to one another on the plurality of semiconductor elements.

In the first method for fabricating a semiconductor device,semiconductor elements are electrically insulated from each other evenwithin the semiconductor substrate owing to a depletion layer formed bya pn junction between each polarity inversion region and thesemiconductor substrate. Therefore, even when the respectivesemiconductor elements are electrically connected to one another throughinterconnects and operated at a high voltage, a leakage current causedbetween the semiconductor elements through the semiconductor substratecan be suppressed to be very small.

The first method for fabricating a semiconductor device preferablyfurther includes, before the step of forming a semiconductor layer madeof a group III-V nitride, a step of forming, in the semiconductorsubstrate, a mark for identifying a position of each of the polarityinversion regions, and the mark is preferably used for identifying theposition of each of the polarity inversion regions in the semiconductorsubstrate in selectively forming the isolation regions between thepolarity inversion regions in forming the plurality of element formingregions. Thus, after forming the semiconductor layer including theactive layers made of the group III-V nitride semiconductor, alignmentbetween each element forming region of the semiconductor layer and eachpolarity inversion region is eased.

The second semiconductor device of the invention includes asemiconductor substrate having buried insulating layers formed, from aprincipal face thereof toward an inner portion thereof, to be spacedfrom one another; a plurality of semiconductor elements formed to bespaced from one another on the semiconductor substrate and respectivelyincluding independent active layers made of a group III-V nitridesemiconductor; and interconnects for electrically connecting thesemiconductor elements to one another.

In the second semiconductor device, even semiconductor elements areelectrically connected to each other as an integrated circuit on asemiconductor substrate having a buried insulating layer, a high voltageoperation can be performed.

In the second semiconductor device, each of the semiconductor elementspreferably has at least one terminal, and at least one of thesemiconductor elements is preferably electrically connected to a portionabove the buried insulating layer of the semiconductor substrate at theterminal. Thus, the semiconductor layer disposed above the buriedinsulating layer attains the same potential as the terminal of thesemiconductor element so as to function as a field plate, and therefore,even when the semiconductor elements are electrically connected to oneanother, the semiconductor device can be operated at a higher voltage.

In the second semiconductor device, wherein each of the semiconductorelements preferably has at least one terminal, and at least one of thesemiconductor elements is preferably electrically connected to a portionunderneath the buried insulating layer of the semiconductor substrate atthe terminal. Thus, potential of the semiconductor layer disposed belowthe buried insulating layer of the semiconductor substrate can be thesame, and therefore, interconnect resistance can be reduced. Inaddition, since the semiconductor layer disposed below the buriedinsulating layer functions as a field plate, even when the semiconductorelements are electrically connected to one another, the semiconductordevice can be operated at a higher voltage.

The second semiconductor device preferably further includes aninsulating isolation region formed in the semiconductor substrate aroundthe semiconductor elements. Thus, the breakdown voltage between thesemiconductor elements can be increased, and hence, the semiconductordevice can be operated at a higher voltage.

The second method for fabricating a semiconductor device of thisinvention includes the steps of forming a semiconductor layer made of agroup III-V nitride on a conducting semiconductor substrate thatincludes buried insulating layers formed, from a principal face thereoftoward an inner portion thereof, to be spaced from one another; forminginsulating isolation regions extending to the buried insulating layersby selectively introducing an impurity into the semiconductor layer andthe semiconductor substrate, whereby forming, on the semiconductorsubstrate, a plurality of element forming regions each including anactive layer in the semiconductor layer; forming a plurality ofsemiconductor elements by forming electrodes on the element formingregions; and forming interconnects for electrically connecting thesemiconductor elements to one another on the plurality of semiconductorelements.

In the second method for fabricating a semiconductor device, a pluralityof element forming regions each including an active layer made of agroup III-V nitride in the semiconductor layer are independently formedby forming a plurality of insulating isolation regions reaching theburied insulating layers. Therefore, even when the respectivesemiconductor elements are electrically connected to one another as anintegrated circuit, a high voltage operation can be performed.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are diagrams of a semiconductor device according toEmbodiment 1 of the invention, wherein FIG. 1A is a plan view thereofand FIG. 1B is a cross-sectional view thereof taken along line Ib-Ib ofFIG. 1A;

FIG. 2 is an enlarged cross-sectional view for showing the structure ofan active layer of the semiconductor device of Embodiment 1;

FIG. 3 is a characteristic diagram for showing the relationship betweenan applied voltage and a leakage current between elements of thesemiconductor device of Embodiment 1 compared with that of aconventional semiconductor device;

FIGS. 4A, 4B and 4C are cross-sectional views for showing procedures ina method for fabricating the semiconductor device of Embodiment 1;

FIGS. 5A, 5B and 5C are cross-sectional views for showing otherprocedures in the method for fabricating the semiconductor device ofEmbodiment 1;

FIGS. 6A and 6B are cross-sectional views for showing other proceduresin the method for fabricating the semiconductor device of Embodiment 1;

FIG. 7 is a cross-sectional view of a semiconductor device according toEmbodiment 2 of the invention;

FIG. 8 is a characteristic diagram for showing the relationship betweenan applied voltage and a leakage current between elements of thesemiconductor device of Embodiment 2 compared with that of aconventional semiconductor device;

FIGS. 9A, 9B and 9C are cross-sectional views for showing procedures ina method for fabricating the semiconductor device of Embodiment 2;

FIGS. 10A, 10B and 10C are cross-sectional views for showing otherprocedures in the method for fabricating the semiconductor device ofEmbodiment 2; and

FIG. 11 is a cross-sectional view of a conventional semiconductor device(HFET) using a group III-V nitride semiconductor.

DETAILED DESCRIPTION OF THE INVENTION Embodiment 1

Embodiment 1 of the invention will now be described with reference tothe accompanying drawings.

FIGS. 1A and 1B show a semiconductor device of Embodiment 1 in which twohigh power HFETs are integrated, and specifically, FIG. 1A is a planview thereof and FIG. 1B is a cross-sectional view thereof taken on lineIb-Ib of FIG. 1A.

As shown in FIG. 1B, a first polarity inversion region 12A and a secondpolarity inversion region 12B both of p-type conductivity spaced fromeach other are selectively formed in an upper portion of a semiconductorsubstrate 11 of, for example, n-type silicon (Si). The bottoms and theside faces of the polarity inversion regions 12A and 12B are coveredwith a p-type low concentration impurity region 13 including a p-typeimpurity in a lower concentration than in the polarity inversion regions12A and 12B. Since the p-type low concentration impurity region 13 isthus provided, a larger depletion layer extends in the semiconductorsubstrate 11 when a high voltage is applied to the semiconductor device,and hence, the breakdown voltage is increased by approximately 20% ascompared with the case where the polarity inversion regions alone areprovided.

As shown in FIGS. 1A and 1B, a first active layer 14A and a secondactive layer 14B in each of which a plurality of group III-V nitridesemiconductor layers are stacked are formed respectively on the firstpolarity inversion region 12A and the second polarity inversion region12B on the principal face of the semiconductor substrate 11.

At this point, the detailed structure of the first active layer 14A andthe second active layer 14B is shown in FIG. 2. Each of the activelayers 14A and 14B includes an initial buffer layer 141 of aluminumnitride (AlN) with a thickness of approximately 50 nm, a superlatticelayer composed of fifteen gallium nitride (GaN) layers 142 and fifteenaluminum nitride (AlN) layers 143 each having a thickness of 25 nm andalternately stacked, and a channel layer 144 with a thickness of 1 μm,which are successively epitaxially grown from the substrate side. Inthis case, the superlattice layer guarantees a high breakdown voltagepeculiar to GaN-based materials.

As shown in FIGS. 1A and 1B, a first gate electrode 15A, a first sourceelectrode 16A and a first drain electrode 17A provided on the both sidesof and spaced from the first gate electrode 15A are formed on the firstactive layer 14A, and a second gate electrode 15B, a second sourceelectrode 16B and a second drain electrode 17B provided on the bothsides of and spaced from the second gate electrode 15B are formed on thesecond active layer 14B. In this manner, a first HFET 10A including thefirst active layer 14A and a second HFET 10B including the second activelayer 14B are constructed on the semiconductor substrate 11. In thisembodiment, the first drain electrode 17A of the first HFET 10A and thesecond drain electrode 17B of the second HFET 10B are adjacent to eachother.

An insulating isolation region 18 is formed around the HFETs 10A and 10Bfor insulating them from each other. The bottom of the isolation region18 is placed at a level equivalent to the bottoms of the first activelayer 14A and the second active layer 14B, and the HFETs 10A and 10Bexhibit high isolation characteristics also within the semiconductorsubstrate 11.

An interlayer insulating film 20 of silicon nitride (Si₃N₄) with athickness of, for example, 300 nm is formed on the isolation region 18over the whole top face including the HFETs 10A and 10B. A first contact21A penetrating through the interlayer insulating film 20 and theisolation region 18 to be connected to the semiconductor substrate 11 isformed in a portion of the interlayer insulating film 20 on a side ofthe first source electrode 16A. Also, a second contact 21B penetratingthrough the interlayer insulating film 20 and the isolation region 18 tobe connected to the semiconductor substrate 11 is formed in a portion ofthe interlayer insulating film 20 on a side of the second sourceelectrode 16B.

Interconnects 22 respectively for connecting the first contact 21A andthe first source electrode 16A to each other, for connecting the firstdrain electrode 17A and the second gate electrode 15B to each other, forconnecting the second contact 21B and the second source electrode 16B toeach other, etc. are formed on the interlayer insulating film 20.

FIG. 3 shows comparison of a leakage current caused between elements inthe semiconductor device of Embodiment 1 and a conventionalsemiconductor device. In the semiconductor device of this embodiment,the leakage current is smaller by two or more figures than in theconventional semiconductor device under application of a high voltage of300 V or more. Thus, a high breakdown voltage is realized in the presentsemiconductor device.

Now, a method for fabricating the semiconductor device having theaforementioned architecture will be described with reference to theaccompanying drawings.

FIGS. 4A through 4C, 5A through 5C, 6A and 6B are cross-sectional viewsfor showing procedures in the method for fabricating the semiconductordevice of Embodiment 1.

First, as shown in FIG. 4A, a first resist film is applied on asemiconductor substrate 11 of n-type silicon, and thereafter, the firstresist film is formed, by lithography, into a first resist pattern 61having openings in a plurality of regions where p-type low concentrationimpurity regions are to be formed. Subsequently, by using the firstresist pattern 61 as a mask, first ion beams 71 including boron (B) areion implanted at acceleration energy of 50 keV and a dose of 1×10¹²cm⁻², thereby forming a plurality of p-type low concentration regions 13in an upper portion of the semiconductor substrate 11.

Next, as shown in FIG. 4B, after removing the first resist pattern 61, asecond resist film is applied on the principal face of the semiconductorsubstrate 11. Subsequently, the second resist film is formed, by thelithography, into a second resist pattern 62 having openings in regionsbetween the p-type low concentration impurity regions 13 on theprincipal face of the semiconductor substrate 11 where polarityinversion regions are to be formed. Thereafter, by using the secondresist pattern 62 as a mask, second ion beams 72 including boron (B) areion implanted at acceleration energy of 50 keV and a dose of 1×10¹³cm⁻², thereby forming a first polarity inversion region 12A and a secondpolarity inversion region 12B both of the p-type conductivity within therespective p-type low concentration impurity regions 13 in thesemiconductor substrate 11.

Then, as shown in FIG. 4C, after removing the second resist pattern 62,a concave mark 11 a to be used as an alignment identifying mark in asubsequent exposure step of forming an active layer (element formingregion) made of a GaN-based semiconductor layer is formed, by dryetching using an etching gas including chlorine (Cl₂) as a principalcomponent, in a region on the principal face of the semiconductorsubstrate 11 where neither the polarity inversion regions 12A and 12Bnor the p-type low concentration impurity regions 13 are formed. At thispoint, regions on the principal face of the substrate excluding theregion where the mark 11 a is to be formed are protected by coveringwith a third resist film (not shown) with a thickness of 2 through 3 μm.

Next, as shown in FIG. 5A, by using the third resist mask as a mask, aprotection film 63 of silicon oxide is deposited by chemical vapordeposition (CVD) so as to fill the mark 11 a and to attain a thicknessof approximately 2 μm on the mark 11 a. Subsequently, after removing thethird resist film, a semiconductor layer 14 of a group III-V nitride isepitaxially grown by metal organic chemical vapor deposition (MOCVD) onthe semiconductor substrate 11 including the polarity inversion regions12A and 12B and the p-type low concentration impurity regions 13.

Then, as shown in FIG. 5B, after aligning a mask by using the mark 11 a,third ion beams 73 including boron (B) are selectively ion implanted atacceleration energy of 500 keV and a dose of 1×10¹⁴ cm⁻² into portionsof the semiconductor layer 14 sandwiched between the p-type lowconcentration impurity regions 13 in the semiconductor substrate 11,thereby forming insulating isolation regions 18 in the portions of thesemiconductor layer 14 sandwiched between the p-type low concentrationimpurity regions 13. Thus, a first active layer 14A and a second activelayer 14B both made of the group III-V nitride are independently formedfrom the semiconductor layer 14 respectively on the polarity inversionregions 12A and 12B. It is noted that the mark 11 a is not shown in FIG.5B.

Next, as shown in FIG. 5C, a fourth resist pattern (not shown) havingopenings in regions where source electrodes and drain electrodes are tobe formed is formed on the active layers 14A and 14B including theisolation regions 18 by the lithography. Thereafter, by using the fourthresist pattern as a mask, a first metal film of a multilayered body oftitanium (Ti) and aluminum (Al) is deposited by, for example, vacuumdeposition or sputtering. Then, a first source electrode 16A and a firstdrain electrode 17A, and a second source electrode 16B and a seconddrain electrode 17B all having an ohmic property are formed respectivelyon the first active layer 14A and the second active layer 14B by what iscalled a lift-off method for removing the fourth resist pattern.Subsequently, a fifth resist pattern (not shown) having openings inregions where gate electrodes are to be formed is formed on the activelayers 14A and 14B including the isolation regions 18 by thelithography. Then, by using the fifth resist pattern as a mask, a secondmetal film of palladium (Pd) is deposited by, for example, the vacuumdeposition. Thereafter, a first gate electrode 15A and a second gateelectrode 15B both having a Schottky property are respectively formed onthe first active layer 14A and the second active layer 14B by thelift-off method for removing the fifth resist pattern. Thus, a firstHFET 10A including the first active layer 14A and a second HFET 10Bincluding the second active layer 14B are formed.

Next, as shown in FIG. 6A, an interlayer insulating film 20 of siliconnitride (Si₃N₄) with a thickness of 300 nm is deposited by the CVD so asto cover the first HFET 10A and the second HFET 10B. Subsequently,openings for exposing contact forming regions and connecting portionsfor connecting the gate electrodes 15A and 15B, the source electrodes16A and 16B and the drain electrodes 17A and 17B to interconnects areformed in the interlayer insulating film 20 by the lithography and thedry etching using an etching gas including fluorocarbon as a principalcomponent. Thereafter, contact holes 18 a for forming substrate contactsof the HFETs 10A and 10B are formed in the isolation regions 18 so as toexpose the semiconductor substrate 11 therein by the lithography and thedry etching using chlorine.

Then, as shown in FIG. 6B, a sixth resist pattern (not shown) forexposing the contact holes 18 a, one ends of the gate electrodes 15A and15B, the source electrodes 16A and 16B and the drain electrodes 17A and17B is formed on the interlayer insulating film 20 by the lithography.Subsequently, by using the sixth resist pattern as a mask, a metal filmof titanium (Ti) and gold (Au) for forming interconnects is deposited bya plating method, thereby forming contacts 21A and 21B and interconnects22.

It is noted that the semiconductor substrate 11 may be a p-typesemiconductor substrate instead of the n-type substrate.

Embodiment 2

Embodiment 2 of the invention will now be described with reference tothe accompanying drawings.

FIG. 7 is a cross-sectional view of a semiconductor device of Embodiment2 in which two high power HFETs are integrated. The plan structure ofthis semiconductor device is similar to that of Embodiment 1 shown inFIG. 1B. Also, like reference numerals are used in FIG. 7 to refer likeelements shown in FIG. 1 and the description is omitted.

In Embodiment 1, the semiconductor substrate 11 of n-type silicon isused as the substrate on which the group III-V nitride semiconductorlayer 14 is epitaxially grown. In contrast, an n-type SOI substrate 31including an n-type upper silicon layer 30 a, a buried oxide layer 30 band an n-type lower silicon layer 30 c is used in Embodiment 2 as shownin FIG. 7.

Specifically, the SOI substrate 31 includes the n-type upper siliconlayer 30 a with a thickness of 0.2 μm, the buried oxide layer 30 b ofsilicon oxide with a thickness of 100 nm formed under the n-type uppersilicon layer 30 a, and the n-type lower silicon layer 30 c formed underthe buried oxide layer 30 b.

In the upper silicon layer 30 a, a first p-type low concentrationimpurity region 32A and a second p-type low concentration impurityregion 32B are formed respectively below a first HFET 10A and a secondHFET 10B so as to be in contact with the buried oxide layer 30 b.

In Embodiment 2, an isolation region 18 reaches the buried oxide layer30 b. Thus, the HFETs 10A and 10B exhibit high isolation characteristicsalso in the SOI substrate 31.

Each of a first contact 21A and a second contact 21B penetrates throughthe buried oxide layer 30 b so as to reach the n-type lower siliconlayer 30 c.

It is noted that the lower end of the isolation region 18 may be placedat a level within the n-type upper silicon layer 30 a of the SOIsubstrate 31 so as to allow the contacts 21A and 21B to be in contactwith the n-type upper silicon layer 30 a. Also in this case, the n-typeupper silicon layer 30 a attains potential equivalent to that of sourceelectrodes 16A and 16B of the HFETs 10A and 10B so as to function as afield plate, and therefore, even when the HFETs 10A and 10B areelectrically connected to each other, a high voltage operation can beperformed.

FIG. 8 shows comparison of a leakage current caused between elements inthe semiconductor device of Embodiment 2 and a conventionalsemiconductor device. In the semiconductor device of this embodiment,the leakage current is smaller by three or more figures than in theconventional semiconductor device under application of a high voltage of300 V or more. Thus, a higher breakdown voltage is realized in thepresent semiconductor device.

Now, a method for fabricating the semiconductor device having theaforementioned architecture will be described with reference to theaccompanying drawings.

FIGS. 9A through 9C and 10A through 10C are cross-sectional views forshowing procedures in the method for fabricating the semiconductordevice of Embodiment 2.

First, as shown in FIG. 9A, a first resist film is applied on an n-typeupper silicon layer 30 a of a SOI substrate 31, and thereafter, thefirst resist film is formed, by the lithography, into a first resistpattern 61 having openings in a plurality of regions where p-type lowconcentration impurity regions are to be formed. Subsequently, by usingthe first resist pattern 61 as a mask, first ion beams 74 includingboron (B) are ion implanted at acceleration energy of 50 keV and a doseof 1×10¹² cm⁻², thereby forming a plurality of p-type low concentrationimpurity regions 32 in the n-type upper silicon layer 30 a. Although thep-type low concentration impurity regions 32 are not always necessary,they are preferably provided because the breakdown voltage of thesemiconductor device is thus further increased.

Next, as shown in FIG. 9B, after removing the first resist pattern 61, asecond resist pattern 64 having openings for exposing regions on theprincipal face of the SOI substrate 31 where the p-type lowconcentration impurity regions 32A and 32B are not formed is formed bythe lithography. Subsequently, by using the second resist pattern 64 asa mask, a hole-shaped mark 30 d to be used as an alignment identifyingmark in a subsequent exposure step of forming an active layer (elementforming region) made of a GaN-based semiconductor layer is formed in then-type upper silicon layer 30 a by the dry etching using an etching gasincluding chlorine as a principal component.

Then, as shown in FIG. 9C, by using the second resist pattern 64 as amask, a protection film 63 of a silicon oxide is deposited by the CVD soas to fill the mark 30 d and attain a thickness of approximately 2 μm onthe mark 30 d. Subsequently, after removing the second resist pattern64, a semiconductor layer 14 of a group III-V nitride is epitaxiallygrown by the MOCVD on the n-type upper silicon layer 30 a of the SOIsubstrate 31 including the p-type low concentration impurity regions 32Aand 32B.

Next, as shown in FIG. 10A, after aligning a mask by using the mark 30d, second ion beams 75 including boron (B) are selectively ion implantedat acceleration energy of 500 keV and a dose of 1×10¹⁴ cm⁻² intoportions of the semiconductor layer 14 sandwiched between the p-type lowconcentration impurity regions 32A and 32B, thereby forming insulatingisolation regions 18 in the portions of the semiconductor layer 14sandwiched between the p-type low concentration impurity regions 32A and32B. Thus, a first active layer 14A and a second active layer 14B bothmade of the group III-V nitride are independently formed from thesemiconductor layer 14 respectively on the p-type low concentrationimpurity regions 32A and 32B. It is noted that the mark 30 d is notshown in FIG. 10A.

Then, as shown in FIG. 10B, in the same manner as in Embodiment 1, afirst source electrode 16A and a first drain electrode 17A, and a secondsource electrode 16B and a second drain electrode 17B all made of amultilayered body of titanium and aluminum are formed respectively onthe first active layer 14A and the second active layer 14B by thelithography and the lift-off method. Subsequently, a first gateelectrode 15A and a second gate electrode 15B both of palladium areformed respectively on the first active layer 14A and the second activelayer 14B by the lithography and the lift-off method. Thus, a first HFET10A including the first active layer 14A and a second HFET 10B includingthe second active layer 14B are formed.

Next, as shown in FIG. 10C, an interlayer insulating film 20 of siliconnitride with a thickness of 300 nm is deposited by the CVD so as tocover the first HFET 10A and the second HFET 10B. Then, openings forexposing contact forming regions and connecting portions for connectingthe gate electrodes 15A and 15B, the source electrodes 16A and 16B andthe drain electrodes 17A and 17B to interconnects are formed in theinterlayer insulating film 20 by the lithography and the dry etchingusing an etching gas including fluorocarbon as a principal component.Thereafter, contact holes 18 a for forming substrate contacts of theHFETs 10A and 10B are formed in the isolation regions 18 by thelithography and the dry etching using chlorine so as to expose then-type lower silicon layer 30 c of the SOI substrate 31 therein.

Then, the lithography and the plating method are executed for forming afirst contact 21A and a second contact 21B and for forming, on theinterlayer insulating film 20, interconnects 22 connected to one ends ofthe gate electrodes 15A and 15B, the source electrodes 16A and 16B andthe drain electrodes 17A and 17B. Thus, the semiconductor device of FIG.7 is completed.

It is noted that the SOI substrate 31 including the n-type layers may bereplaced with a SOI substrate including p-type upper and lower siliconlayers.

Further, in each of Embodiments 1 and 2 when at least the channel layer144 and the GaN layer 142 as the supperlattice layers of the firstactive layer 14A and the second active layer 14B are n-type, a depletionlayer is formed in the n-type layer within each active layer 14A, 14Bbecause the polarity inversion regions 12A, 12B in the semiconductorsubstrate 11 are p-type, resulting in further reduction of the leakagecurrent.

It is noted that in each of Embodiments 1 and 2, the supperlatticelayers made of the GaN layer 142 and the AlN layer 143 are notnecessarily formed in the active layers 14A, 14B, respectively. With nosupperlattice layer provided, a pn junction is formed between the p-typepolarity inversion regions 12A, 12B of the semiconductor substrate 11 ifat least the channel layer 144 in each active region 14A, 14B is n-type,so that the depletion layer formed around the pn junction furtherexpands even at application of higher positive voltage to each activelayer 14A, 14B. Hence, the leakage current is suppressed, resulting inhigher breakdown voltage.

As described so far, in the semiconductor device and the fabricationmethod for the same of this invention, a semiconductor device includinga plurality of semiconductor elements all of which include independentactive layers made of a group III-V nitride semiconductor and areelectrically connected to one another can be integrated on asemiconductor substrate with a conducting property, and therefore, theinvention is useful for a semiconductor device including high powerelements or the like.

1-7. (canceled)
 8. A method for fabricating a semiconductor devicecomprising the steps of: forming, in an upper portion of a semiconductorsubstrate of a first conductivity type, a plurality of polarityinversion regions spaced from one another by selectively introducing afirst impurity of a second conductivity type into said semiconductorsubstrate; forming a semiconductor layer made of a group III-V nitrideover said semiconductor substrate including said polarity inversionregions; forming insulating isolation regions extending from saidsemiconductor layer to said semiconductor substrate by selectivelyintroducing a second impurity into portions of said semiconductor layerand said semiconductor substrate disposed around said polarity inversionregions, whereby respectively forming, on said polarity inversionregions, a plurality of element forming regions each including an activelayer in said semiconductor layer; forming a plurality of semiconductorelements by forming electrodes on said element forming regions; andforming interconnects for electrically connecting said semiconductorelements to one another on said plurality of semiconductor elements. 9.The method for fabricating a semiconductor device of claim 8, furthercomprising, before the step of forming a semiconductor layer made of agroup III-V nitride, a step of forming, in said semiconductor substrate,a mark for identifying a position of each of said polarity inversionregions, wherein said mark is used for identifying the position of eachof said polarity inversion regions in said semiconductor substrate inselectively forming said isolation regions between said polarityinversion regions in forming said plurality of element forming regions.10. A semiconductor device comprising: a semiconductor substrate havingburied insulating layers formed, from a principal face thereof toward aninner portion thereof, to be spaced from one another; a plurality ofsemiconductor elements formed to be spaced from one another on saidsemiconductor substrate and respectively including independent activelayers made of a group III-V nitride semiconductor; and interconnectsfor electrically connecting said semiconductor elements to one another.11. The semiconductor device of claim 10, wherein each of saidsemiconductor elements has at least one terminal, and at least one ofsaid semiconductor elements is electrically connected to a portion abovesaid buried insulating layer of said semiconductor substrate at saidterminal.
 12. The semiconductor device of claim 10, wherein each of saidsemiconductor elements has at least one terminal, and at least one ofsaid semiconductor elements is electrically connected to a portionunderneath said buried insulating layer of said semiconductor substrateat said terminal.
 13. The semiconductor device of claim 10, furthercomprising an insulating isolation region formed in said semiconductorsubstrate around said semiconductor elements.
 14. A method forfabricating a semiconductor device comprising the steps of: forming asemiconductor layer made of a group III-V nitride on a conductingsemiconductor substrate that includes buried insulating layers formed,from a principal face thereof toward an inner portion thereof, to bespaced from one another; forming insulating isolation regions extendingto said buried insulating layers by selectively introducing an impurityinto said semiconductor layer and said semiconductor substrate, wherebyforming, on said semiconductor substrate, a plurality of element formingregions each including an active layer in said semiconductor layer;forming a plurality of semiconductor elements by forming electrodes onsaid element forming regions; and forming interconnects for electricallyconnecting said semiconductor elements to one another on said pluralityof semiconductor elements.